The project is aimed to solve the key problems impeding the organization of the high volume manufacturing based on the technology of EUV lithography. While the research carried out, the possibility of technical implementation of proposed solutions to the high volume manufacturing lithography to be shown. Solutions being developed by the project team lays in different areas, such as: switch to the solution of less than 22 nm processes, optical nanodiagnostics, inspection, cleaning and protection of multilayer EUV-optics in nanolithographic machines.
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